All-water-based electron-beam lithography using silk as a resist - Concepedia

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All-water-based electron-beam lithography using silk as a resist

283

Citations

17

References

2014

Year

Sunghwan Kim, Benedetto Marelli, Mark A. Brenckle, Alexander N. Mitropoulos, Eun-Seok Gil, Konstantinos Tsioris, Hu Tao, David L. Kaplan, Fiorenzo G. Omenetto

Nature Nanotechnology

Materials ScienceAll-water-based Electron-beam LithographyEngineeringElectron-beam LithographyMicrofabricationBeam LithographySurface ScienceApplied PhysicsNanolithographyNanolithography Method

References

	Year	Citations

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