Applied Physics Letters · 2012 · 48 citations · 10 references
Natural SciencesMaterials EngineeringMaterials ScienceCrystal StructureElectronic MaterialsNanomaterialsCellular UltrastructureEpitaxial GrowthSemiconductor Crystal GrowthTransmission Electron MicroscopyX-ray CrystallographyX-ray DiffractionGallium Nitride (Gan) MaterialsGallium Nitride Crystal GrowthHigh-resolution X-ray DiffractionLattice Fringe AnalysisMicrostructureMolecular Beam EpitaxyX-ray Diffraction Analysis
Nominally lattice matched InAlN/GaN was grown by plasma-assisted molecular beam epitaxy, and the intrinsic microstructure was investigated via x-ray diffraction, transmission electron microscopy, and atom probe tomography. The InAlN showed a cellular structure, which was comprised of ∼10 nm wide Al-rich cores and ∼1 nm In-rich InAlN intercellular boundaries. Despite the strong laterally non-uniform In distribution, both vertical and lateral lattices are unperturbed by the cellular structure, as evidenced by strong thickness fringes in on-axis ω−2θ high resolution x-ray diffraction scans, coherence lengths derived from on-axis (0002) and off-axis (101¯2) ω−2θ high resolution x-ray diffraction scans, and a modified Williamson-Hall analysis for on-axis reflections.
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