Publication | Open Access
Third-harmonic UV generation in silicon nitride nanostructures
43
Citations
25
References
2013
Year
Optical MaterialsEngineeringSilicon Nitride FilmOptoelectronic DevicesSilicon On InsulatorSemiconductor NanostructuresOptical PropertiesNanophotonicsMaterials SciencePhotonicsPhysicsNon-linear OpticPhotonic MaterialsPhotonic DeviceThird-harmonic Uv GenerationSilicon NitrideApplied PhysicsOptoelectronicsSilicon Nitride Films
We report on strong UV third-harmonic generation from silicon nitride films and resonant waveguide gratings. We determine the absolute value of third-order susceptibility of silicon nitride at wavelength of 1064 nm to be χ(³) (-3ω,ω,ω,ω) = (2.8 ± 0.6) × 10⁻²⁰m²/V², which is two orders of magnitude larger than that of fused silica. The third-harmonic generation is further enhanced by a factor of 2000 by fabricating a resonant waveguide grating onto a silicon nitride film. Our results extend the operating range of CMOS-compatible nonlinear materials to the UV spectral regime.
| Year | Citations | |
|---|---|---|
Page 1
Page 1