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High sensitivity optical image processing device based on CdZnTe/ZnTe multiple quantum well structures
73
Citations
10
References
1991
Year
Quantum PhotonicsOptical MaterialsEngineeringOptoelectronic DevicesImage SensorOptical ComputingSemiconductorsOptical PropertiesCdznte/znte Multiple QuantumNanophotonicsPhotonicsQuantum SciencePhotoluminescencePhysicsQuantum DevicePhotonic MaterialsOptoelectronic MaterialsExciton Absorption PeakOptical Image ProcessingPhotonic DeviceStark EffectApplied PhysicsQuantum DevicesQuantum Photonic DeviceOptoelectronicsOptical Logic Gate
We present results on the operation of a high sensitivity semi-insulating multiple quantum well device for optical image processing. This device operates in the visible spectrum using II-VI CdZnTe/ZnTe multiple quantum well structures. Incident light creates charge carriers that screen an applied ac electric field modulating the absorption and refractive index of the structure through the quantum confined Stark effect. In this way, an incident intensity pattern is recorded as an absorption and refractive index variation. The semi-insulating nature of the material eliminates the need for pixelation. In a wave-mixing experiment, a peak diffraction efficiency of 0.25% was observed from 2.25 μm active layer of the device. Two-beam-coupling gain coefficients of ∼500 cm−1 at wavelengths longer than the exciton absorption peak should be possible.
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