Publication | Closed Access
Optical Activation of Er<sup>3+</sup> Implanted in Silicon by Oxygen Impurities
148
Citations
6
References
1990
Year
Optical MaterialsEngineeringLaser ApplicationsOptoelectronic DevicesSilicon On InsulatorLuminescence PropertySemiconductorsLuminescence SpectraSims MeasurementsElectronic DevicesOptical PropertiesCompound SemiconductorMaterials SciencePhotonicsPhotoluminescenceOptoelectronic MaterialsPhotonic DeviceOxygen ImpuritiesApplied PhysicsOptoelectronicsOptical DevicesµM Luminescence
Luminescence spectra and SIMS measurements of Er-doped silicon are presented in this paper. Luminescence was found to be stronger in Czochralski-grown Si crystals, known to contain up to 10 18 cm -3 of oxygen center. Direct role played by oxygen impurities in the optical activation of the 1.54 µm luminescence was demonstrated by implanting oxygen into Er implanted layers in silicon at concentrations comparable to those of Er. Possible mechanisms of enhancement of photoluminescence are discussed.
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