Publication | Closed Access
Bipolar switching behavior in TiN/ZnO/Pt resistive nonvolatile memory with fast switching and long retention
137
Citations
16
References
2008
Year
Materials ScienceMaterials EngineeringElectrical EngineeringBipolar Switching BehaviorsEngineeringLong RetentionNon-volatile MemoryNanoelectronicsOxide ElectronicsApplied PhysicsFast SwitchingOxygen ReservoirTin/zno/pt DevicesMemory DeviceMicroelectronicsPhase Change MemoryNonvolatile Memory
Highly stable bipolar resistive switching behaviors of TiN/ZnO/Pt devices were demonstrated for the first time. The excellent memory characteristics including fast switching speed (<20 ns for set and <60 ns for reset), long retention (in the order of 105 s) and non-electroforming process were demonstrated. The bipolar switching behaviors can be explained by formation and rupture of the filamentary conductive path consisting of oxygen vacancies. The excellent bipolar switching behavior can be attributed to the significant amount of oxygen vacancies in ZnO film and the effect of TiN layer serving as an oxygen reservoir.
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