IEEE Journal of Solid-State Circuits · 2005 · 62 citations · 13 references
EngineeringElectrical EngineeringMicroelectronicsMicrowave EngineeringSemiconductor DevicesHigh-frequency Semiconductor DevicesIntegrated Circuit DesignIntegrated Circuit DevicesMicrowave AmplifiersRadio-frequency Integrated CircuitsSemiconductor HeterostructuresBicmos TechnologyCmos Microwave AmplifiersCmos OscillatorsConstraintsGainMillimeter-wave Integrated CircuitsNoise FigureSige Bicmos Design
This paper describes a 230-GHz self-aligned SiGeC heterojunction bipolar transistor developed for a 90-nm BiCMOS technology. The technical choices such as the selective epitaxial growth of the base and the use of an arsenic-doped monocrystalline emitter are presented and discussed with respect to BiCMOS performance objectives and integration constraints. DC and high-frequency device performances at room and cryogenic temperatures are given. HICUM model agreement with the measurements is also discussed. Finally, building blocks with state-of-the-art performances for a CMOS compatible technology are presented: A ring oscillator with a minimum stage delay of 4.4 ps and a 40-GHz low-noise amplifier with a noise figure of 3.9 dB and an associated gain of 9.2 dB were fabricated.
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SiGe HBTs with cut-off frequency of 350 GHz
Jae-Sung Rieh, B. Jagannathan, H. Chen et al. · 2003 · 201 citations
Ultra high speed SiGe NPN for advanced BiCMOS technology
M. Racanelli, K. Schuegraf, A. Kalburge et al. · 2002 · 75 citations