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Dielectric Property of Epitaxial Films of BaTiO<sub>3</sub> Synthesized by Laser Ablation
19
Citations
6
References
1994
Year
EngineeringLaser ApplicationsLaser AblationThin Film Process TechnologyEpitaxial Batio 3Molecular Beam EpitaxyPulsed Laser DepositionEpitaxial GrowthMaterials ScienceMaterials EngineeringOxide HeterostructuresDielectric PropertyOxide ElectronicsRelative Dielectric ConstantMaterial AnalysisEpitaxial FilmsSurface ScienceApplied PhysicsThin Films
Epitaxial BaTiO 3 films have been synthesized on (100)SrTiO 3 at the substrate temperature of 700° C and 100 mTorr of oxygen by the method of laser ablation. The surface of the film is found to be flat with a surface roughness of about 7 nm. For the film with the thickness of 2000 Å, the relative dielectric constant, ε r , exhibits a broad peak at about 150° C; on the other hand, the ε r exhibits a sharp peak at the tetragonal to orthorhombic transition.
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