Properties of <i>a</i>‐Si,Ge:H,F alloys prepared by rf glow discharge in an ultrahigh vacuum reactor

Abstract

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation J. Kolodzey, S. Aljishi, R. Schwarz, D. Slobodin, S. Wagner; Properties of a‐Si,Ge:H,F alloys prepared by rf glow discharge in an ultrahigh vacuum reactor. J. Vac. Sci. Technol. A 1 November 1986; 4 (6): 2499–2504. https://doi.org/10.1116/1.573717 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search