Applied Physics Letters · 1991 · 99 citations · 7 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsSurface ScienceThin FilmsEpitaxial GrowthLaser Surface ProcessingOptical Thin FilmsPerovskite MaterialsThin Film Optical PropertiesThin-film DepositionExcitationLaser AblationLow-temperature DepositionLow-temperature GrowthLow-temperature MaterialsMaterial AblationThin Oxide FilmsUltrafast Laser Excitation
We have formed PbTiO3 thin films on (100) SrTiO3 substrates at a temperature of 350 °C using an ArF excimer laser ablation technique. Until now, PbTiO3 films have not been formed at temperatures lower than 500 °C using other thin-film techniques. The important points in the present study are the laser excitation of the substrate during the film growth and the lattice matching between the film and the substrate. The film deposited on the SrTiO3 substrate shows preferential orientation of the c-axis perpendicular to the substrate surface.
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