Publication | Closed Access
Preparation of PbTiO3 thin films at low temperature by an excimer laser ablation technique
99
Citations
7
References
1991
Year
Materials ScienceEpitaxial GrowthOptical MaterialsEngineeringApplied PhysicsLaser ApplicationsLaser AblationPbtio3 FilmsLaser Processing TechnologySubstrate SurfaceLaser-assisted DepositionThin FilmsPulsed Laser DepositionLaser-surface InteractionsPbtio3 Thin FilmsLow Temperature
We have formed PbTiO3 thin films on (100) SrTiO3 substrates at a temperature of 350 °C using an ArF excimer laser ablation technique. Until now, PbTiO3 films have not been formed at temperatures lower than 500 °C using other thin-film techniques. The important points in the present study are the laser excitation of the substrate during the film growth and the lattice matching between the film and the substrate. The film deposited on the SrTiO3 substrate shows preferential orientation of the c-axis perpendicular to the substrate surface.
| Year | Citations | |
|---|---|---|
Page 1
Page 1