Publication | Closed Access
On the field effect of the electrical conductance of discontinuous thin metal films
12
Citations
7
References
1977
Year
EngineeringThin Film Process TechnologyActivated Tunneling ModelCharge TransportTunneling MicroscopyNanoelectronicsCharge Carrier TransportThin Film ProcessingMaterials ScienceElectrical EngineeringElectromigration TechniquePhysicsSemiconductor MaterialMicroelectronicsElectrical PropertyField EffectElectrical ConductanceHigh Electric FieldSurface ScienceApplied PhysicsCondensed Matter PhysicsThin FilmsElectrical Insulation
In the activated tunneling model of electrical conductance of discontinuous thin metal films, non-Ohmic conductance has thus far been explained by a field-dependent activation energy at a high electric field. We point out that this interpretation is not appropriate. Alternatively, the field effect should be ascribed to the non-Ohmicity of the tunneling current density at a high electric field. Results of the computation are presented.
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