Kinetic simulation of vapor deposition and growth

Abstract

We present a stochastic Monte Carlo model of vapor deposition and growth of a crystalline, binary, ${\mathit{A}}_{3}$B metallic alloy with a negative energy of mixing. Our model incorporates deposition and surface diffusion in a physically correct manner and allows us to simulate deposition rates that are experimentally realizable. We examine the effects of deposition rate and temperature on the development of short-range order (SRO) in the as-deposited film. We see SRO increase with temperature, but we see no corresponding development of anisotropic SRO (preferential ordering of A-B pairs along the growth direction).