Vitreous silica processing by vapor phase deposition for optical fiber preform

Abstract

Abstract With the fast development of information technologies, the demand for high performance and low cost, for example in the production of optical fiber, is continuously increasing, specifically in the case of Brazil that depends on improved silica glass tube in the Modified Chemical Vapor Deposition process. In the case of Vapor-Phase Deposition (VPD) technique, deposition efficiency is very high with lower production cost in comparison with other processes. In the present work, we report some results on high purity vitreous silica processing by VPD technique, such as: efficiency as high as 80% for a burner with circular cross-section, deposition of soot with neutral-like network and randomly aggregated structure, good consolidation process by heat treatment in electrical furnace, at temperature up to 1400°C and controlled atmosphere and observation of a layer of bubbles arrested at the interface of two deposited spiral soot layers.