Pulsed Laser Deposition of High-Quality (K,Na)NbO₃ Thin Films on SrTiO₃ Substrate Using High-Density Ceramic Targets

Abstract

High-quality (K,Na)NbO 3 thin films were successfully deposited on a (100) SrTiO 3 (STO) substrate by pulsed laser deposition. High-density KNbO 3 (KN), (K 0.5 Na 0.5 )NbO 3 (KNN) and NaNbO 3 (NN) ceramic targets were prepared by spark plasma sintering (SPS). The crystallographic analyses of the film were performed by conventional X-ray diffraction (XRD) analysis and rocking curve measurement. The XRD reciprocal space map was also measured to determine the lattice constants of the film and analyze the crystallographic relationship between the grown film and the STO substrate. The fluctuation change in the orientation of crystals in the grown film decreased and the smoothness of the film surface improved with increasing sodium content of the film. For the NN films, the full width at half maximum (FWHM) of the rocking curve was as small as 0.12°. The XRD reciprocal space map measurements showed that the lattices of the KN and KNN films relaxed on the STO substrate but the NN film was restricted to it.