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Electrochemical impedance characteristics of Ta/Cu contact regions in polishing slurries used for chemical mechanical planarization of Ta and Cu: considerations of galvanic corrosion

Materials EngineeringMaterials ScienceChemical EngineeringTa/cu Contact RegionsEngineeringCorrosion ProtectionCorrosionMechanical EngineeringElectrochemical Impedance CharacteristicsCorrosion InhibitionChemical Mechanical PlanarizationElectrochemistryCorrosion Resistance