Direct extreme UV-lithographic conversion of metal xanthates into nanostructured metal sulfide layers for hybrid photovoltaics

Abstract

We present a versatile strategy toward the preparation of nanostructured metal sulfide layers, which exploits the photosensitivity of metal xanthates as a powerful tool for lithographic structuring. Using extreme ultraviolet interference lithography (EUV-IL), we successfully realized well-defined column and comb nanostructures. This approach provides new pathways to fabricate highly ordered structured metal sulfide layers with periodicities far below 100 nm for potential application in hybrid solar cells.