Efficient focusing of hard x rays to 25nm by a total reflection mirror

TLDR

Nanofocused x rays are indispensable for high‑resolution, high‑sensitivity x‑ray nanoscopy and spectroscopy, and total‑reflection mirrors offer a promising high‑efficiency, energy‑tunable focusing method. The authors aim to develop a fabrication system for hard x‑ray mirrors using elastic emission machining, microstitching interferometry, and relative angle determinable stitching interferometry. They fabricated mirrors with these techniques and tested the focusing performance at the 1‑km‑long SPring‑8 beamline. Using an ultraprecisely figured mirror, they achieved hard x‑ray line focusing with a 25 nm beam width at 15 keV.

Abstract

Nanofocused x rays are indispensable because they can provide high spatial resolution and high sensitivity for x-ray nanoscopy/spectroscopy. A focusing system using total reflection mirrors is one of the most promising methods for producing nanofocused x rays due to its high efficiency and energy-tunable focusing. The authors have developed a fabrication system for hard x-ray mirrors by developing elastic emission machining, microstitching interferometry, and relative angle determinable stitching interferometry. By using an ultraprecisely figured mirror, they realized hard x-ray line focusing with a beam width of 25nm at 15keV. The focusing test was performed at the 1-km-long beamline of SPring-8.