Low temperature silicon and Si1−xGex epitaxy by rapid themal chemical vapour deposition using hydrides - Concepedia

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Low temperature silicon and Si1−xGex epitaxy by rapid themal chemical vapour deposition using hydrides

47

Citations

11

References

1992

Year

D. Dutartre, P. Warren, Isabelle Berbézier, P. Perret

Thin Solid Films

Materials ScienceChemical EngineeringLow Temperature SiliconEngineeringSurface ScienceApplied PhysicsSi1−xgex EpitaxySemiconductor Device FabricationMolecular Beam EpitaxySilicon On InsulatorEpitaxial GrowthChemical Vapor Deposition

References

	Year	Citations

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