Focused electron beam induced deposition of gold

Abstract

Codeposition of hydrocarbons is a severe problem during focused electron beam writing of pure metal nanostructures. When using organometallic precursors, a low metal content carbonaceous matrix embedding and separating numerous nanosized metal clusters is formed. In this work, we present a new and easy approach to obtain high purity gold lines: the use of inorganic PF3AuCl as a precursor. Electrical resistivities as low as 22 μΩ cm at 295 K (ten times the bulk Au value) were obtained. This is to our knowledge the best value for focused electron beam deposition obtained from the vapor phase so far. No special care was taken to prevent hydrocarbon contamination. The deposited nanostructure consists of gold grains varying in size and percolation with beam parameters.