Single electron tunneling and suppression of short-channel effects in submicron silicon transistors

Abstract

We report measurements on submicron metal–oxide–semiconductor field effect transistors equipped with a gate on three sides of the channel. At room temperature, a strong suppression of short-channel effects has been achieved for the narrowest channels. At liquid helium temperatures, the same devices exhibit clear conductance oscillations in the subthreshold regime, indicating that a quantum dot has formed in the disordered channel.