Japanese Journal of Applied Physics · 1987 · 14 citations · 0 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsOptoelectronicsThin FilmsAmorphous MaterialsAmorphous SolidsCrystallization AnalysisCrystallization ProcessesKinetics Of Phase TransformationsOptical Thin FilmsActivation EnergyAmorphous SeleniumAmorphous State CharacterizationAmorphous Thin FilmsAtomic BondingCrystallizationCrystallization KineticsThin-film Crystallization
The mechanism of fast crystallization of In-Se phase-change optical recording films by Tl addition is studied determining atomic arrangement by XPS and using crystallization kinetics of a written amorphous state. Thallium ions in the In-Se-Tl film found to be monovalent, so they cut atomic bonds. The minimum crystallization time by an laser-beam irradiation is shorten to 0.2µs by the Tl addition. The Tl addition increases both the activation energy and frequency factor for crystallization. Cobalt addition to the In-Se-Tl film not only stabilizes amorphous state but also makes erasing faster. The minimum crystallization time is further shorten to 0.06 µs. The retention time of written dot's amorphous state is estimated to be 100 years at 150°C. More than 2500 times of single-beam overwrite is achieved using In-Se-Tl-Co disk. Carrier to noise ratio of a 2.5MHz signal is 54dB at 1800rpm.