Publication | Closed Access
Large On-Current Enhancement in Hetero-Junction Tunnel-FETs via Molar Fraction Grading
25
Citations
14
References
2014
Year
EngineeringSource RegionMolar Fraction GradingQuantum EngineeringSemiconductor DeviceSemiconductorsTunneling MicroscopyMolar-fraction GradingNanoelectronicsElectronic EngineeringQuantum MaterialsSemiconductor TechnologyQuantum ScienceElectrical EngineeringPhysicsMicroelectronicsCategoryiii-v SemiconductorMolar FractionApplied PhysicsQuantum Devices
We propose to employ a grading of the molar fraction in the source region of III-V hetero-junction tunnel-FETs as a means to improve the on-current without degrading the subthreshold swing. Our full quantum simulations show that the molar-fraction grading increases the on-current by enlarging the hole wave function penetration from the source to the channel region. We also compare the performance of graded AlGaSb/InAs tunnel FETs and InAs MOSFETs and show that at V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">DS</sub> =0.3 V, the tunnel device can outperform the MOSFET in terms of both on-current and subthreshold slope.
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