Defects in hard coatings studied by positron annihilation spectroscopy and x-ray diffraction

Abstract

TiNx (0.5<x<1.1) thin films, grown on stainless steel substrates via reactive sputtering, have been studied using positron annihilation spectroscopy and x-ray diffraction techniques. The deposition parameters investigated include nitrogen partial pressure, deposition power, substrate bias, film thickness, and substrate condition. The synergistic effects of using multiple techniques to characterize the same or similar samples is emphasized.