Publication | Open Access

Near field induced defects and influence of the liquid layer thickness in Steam Laser Cleaning of silicon wafers

Silicon WafersEngineeringLiquid Layer ThicknessMicrofabricationSurface ScienceApplied PhysicsLaser ApplicationsLaser Processing TechnologySemiconductor Device FabricationLaser-surface InteractionsLaser-assisted DepositionPulsed Laser DepositionMicroelectronicsSteam Laser Cleaning