Electron Beam Recording beyond 200 Gbit/in² Density for Next Generation Optical Disk Mastering

Abstract

We had developed an electron beam recorder for high-density mastering. The electron beam recorder has a capability to record high-density patterning beyond 200 Gbit/in 2 density because it has characteristic of fine beam convergence. The behavior of electron scattering is important to realizing high-density patterning. Scattered electrons degrade patterning resolution and high-density patterning can not be realized. Thus, we adopted a new substrate made of a material that reduces the influence of the electron backscattering and attempted to record high density patterning beyond 200 Gbit/in 2 density. As experimental result, 300 Gbit/in 2 density patterning could be realized.