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Soft nitridation of GaAs(100) by hydrazine sulfide solutions: Effect on surface recombination and surface barrier
27
Citations
22
References
2007
Year
SemiconductorsMaterials ScienceSurface Fermi LevelWide-bandgap SemiconductorEngineeringSurface BarrierSoft NitridationSurface ScienceApplied PhysicsAluminum Gallium NitrideChemistryMicroelectronicsOptoelectronicsCategoryiii-v SemiconductorCompound SemiconductorHydrazine Sulfide Solutions
The effect of nitridation of GaAs(100) by hydrazine sulfide solutions on the surface recombination velocity and surface barrier has been studied using photoluminescence and photoreflectance spectroscopies. Nitridation produces a decrease of surface recombination velocity by a factor of 26. After three years of air exposure, the recombination velocity is still smaller than for the naturally oxidized surface by a factor of 11. The observed effect is caused by a continuous nitride monolayer bonded with the GaAs substrate. The surface Fermi level is still pinned near midgap, which is attributed to residual unpassivated surface defects.
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