Characterization of the CH4/H2/Ar high density plasma etching process for ZnSe - Concepedia

Concepedia

Publication | Closed Access

Characterization of the CH4/H2/Ar high density plasma etching process for ZnSe

24

Citations

29

References

2001

Year

Charles R. Eddy, D. Leonhardt, V. A. Shamamian, J. E. Butler

Journal of Electronic Materials

Materials EngineeringMaterials ScienceChemical EngineeringEngineeringCh4/h2/ar High DensitySurface ScienceApplied PhysicsGas Discharge PlasmaMicroelectronicsPlasma EtchingPlasma ProcessingPlasma Application

References

	Year	Citations

Page 1