Diffusion of Fluorine in Silica

Abstract

Abstract Diffusion constants of fluorine in silica were determined at temperatures between 1385 K and 1873 K. Samples were prepared by the PCVD (Plasma activated Chemical Vapor Deposition) method and diffusion profiles measured by SEM investigations. The resulting least squares fit is log( D (cm 2 s −1 )) = ‐0.920 ‐ 18337 K/ T .