Journal of Applied Physics · 2006 · 45 citations · 9 references
Natural SciencesMaterials EngineeringMaterials ScienceCrystal StructureElectronic MaterialsMaterials ChemistryAlloysDopingIon ImplantationX-ray CrystallographyX-ray DiffractionX-ray Photoelectron SpectroscopyDilution ProcessesDilution RatiosExtended X-ray Absorption Fine StructureIon Implantation EffectsX-ray Absorption Spectroscopy
X-ray diffraction, transmission electron microscopy, extended x-ray absorption fine structure spectroscopy, and x-ray photoemission spectroscopy have been used to study the structural properties of MnxGe1−x ion implanted alloys (x≃0.04) at 240 and 270°C substrate temperatures. Between 40% and 50% of the Mn atoms are found to occupy substitutional sites. No interstitial Mn atoms are found. The Mn–Ge coordination distance is 2.50(2)Å. Moreover, in the subsurface implanted layer [up to 32(2)nm depth] all the Mn atoms are effectively diluted in the Ge matrix, reaching a peak doping concentration of 7±1%.
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A Group-IV Ferromagnetic Semiconductor: Mn <sub> <i>x</i> </sub> Ge <sub> 1− <i>x</i> </sub>
Y. D. Park, Aubrey T. Hanbicki, Steven C. Erwin et al. · Science · 2002 · 1.6K citations
Ferromagnetic percolation in MnxGe1−x dilute magnetic semiconductor
An‐Ping Li, Jian Shen, J. R. Thompson et al. · Applied Physics Letters · 2005 · 128 citations
Phase separation and dilution in implanted MnxGe1−x alloys
L. Ottaviano, M. Passacantando, Silvia Picozzi et al. · Applied Physics Letters · 2006 · 76 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +15