Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy

A. Claudel, V. Fellmann, Isabelle Gélard, N. Coudurier, D. Sauvage, M. Balaji, E. Blanquet, Raphaël Boichot, Guillaume Beutier, Stéphane Coindeau,

Thin Solid Films · 2014 · 27 citations · 42 references

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