Comparison of the agglomeration behavior of thin metallic films on SiO2

Abstract

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation P. R. Gadkari, A. P. Warren, R. M. Todi, R. V. Petrova, K. R. Coffey; Comparison of the agglomeration behavior of thin metallic films on SiO2. Journal of Vacuum Science & Technology A 1 July 2005; 23 (4): 1152–1161. https://doi.org/10.1116/1.1861943 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search