Publication | Closed Access
Properties of silicon nitride films prepared by plasma-enhanced chemical vapour deposition of SiH4-N2 mixtures
27
Citations
14
References
1986
Year
Materials ScienceChemical EngineeringEngineeringPlasma-enhanced Chemical VapourSurface ScienceApplied PhysicsSih4-n2 MixturesSemiconductor Device FabricationSilicon On InsulatorPlasma ProcessingPlasma EtchingChemical Vapor DepositionSilicon Nitride Films
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