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Ultraviolet and violet light-emitting GaN diodes grown by low-pressure metalorganic chemical vapor deposition
117
Citations
13
References
1993
Year
Wide-bandgap SemiconductorElectrical EngineeringSolid-state LightingP-n Junction ElectroluminescenceUv RadiationPhysicsViolet LightNanoelectronicsEngineeringApplied PhysicsNew Lighting TechnologyAluminum Gallium NitrideGan Power DeviceMicroelectronicsOptoelectronicsCategoryiii-v SemiconductorCompound Semiconductor
Both metal-insulator-semiconductor and p-n junction electroluminescence have been observed in thin-film, metalorganic chemical vapor deposition-grown GaN diodes thermally annealed in N2. UV radiation, peaking near 380 nm, is emitted when electrons are injected from the undoped, n-type material into the Mg-doped, p-type GaN. Violet light, peaking near 430 nm, is obtained by injecting electrons into p-type material from either n-type material or non-ohmic metal contacts. The present results support and extend earlier interpretations of the nature of the recombination centers in GaN.
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