Applied Physics Letters · 2003 · 51 citations · 12 references
EngineeringMaterials EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsEpitaxial GrowthQuantum OptoelectronicsQuantum WellsSemiconductor DefectsSemiconductor HeterostructuresSemiconductor PhysicsAlloy Composition EffectsAnnealing Temperature EffectsMolecular Beam EpitaxyPhotoluminescence In Quantum WellsQuantum Well Band StructureQuantum Well GrowthQuantum Well StructuresSubstrate Temperature Effects
Growing the capping layer of a GaInNAs/GaAs quantum well at typical substrate temperature for GaAs growth by molecular-beam epitaxy, like 580 °C, was found to induce a blueshift of the quantum-well emission whose magnitude significantly increased as the quantum-well growth temperature was decreased. The growth-temperature-dependent (self-)annealing-induced blueshift is correlated with the presence of indium and occurs without observable changes in alloy macroscopic composition or quantum-well structure. The underlying cause for the increase in blue shift with decreasing quantum-well growth temperature appears to be an enhancement in the amount of In–N bonds formed by (self-)annealing, likely through a defect-assisted mechanism.
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