Publication | Closed Access
The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N2/Ar/hexamethyldisilazane microwave plasma
36
Citations
48
References
2011
Year
Materials ScienceOptical MaterialsEngineeringApplied PhysicsCh4 AdditionSicn Thin FilmsPlasma ProcessingCarbideCh4/n2/ar/hexamethyldisilazane Microwave Plasma
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