Characterization of titanium silicide by Raman spectroscopy for submicron IC processing - Concepedia

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Characterization of titanium silicide by Raman spectroscopy for submicron IC processing

14

Citations

8

References

1998

Year

E.H. Lim, Gamani Karunasiri, S. J. Chua, Zexiang Shen, K. L. Pey, K. H. Lee, L. Chan

Microelectronic Engineering

Materials ScienceSubmicron Ic ProcessingEngineeringNanomaterialsNanotechnologySpectroscopySurface-enhanced Raman ScatteringApplied PhysicsSiliceneTitanium SilicideSpectroscopic PropertySpectroscopic Method

References

	Year	Citations

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