Publication | Closed Access
Quantum calculations of the change of refractive index due to free carriers in silicon with nonparabolic band structure
30
Citations
15
References
1990
Year
Optical MaterialsEngineeringQuantum CalculationsOptoelectronic DevicesIntegrated CircuitsImpurity BandsOptical CharacterizationSilicon On InsulatorSemiconductor NanostructuresSemiconductorsOptical PropertiesQuantum-mechanical ApproachGuided-wave OpticNanophotonicsSemiconductor TechnologyQuantum SciencePhotonicsPhysicsEnergy-band GapSemiconductor MaterialSemiconductor Device FabricationPhotonic DeviceRefractive IndexApplied PhysicsNonparabolic Band StructureQuantum Photonic DeviceOptoelectronics
A quantum-mechanical approach used to calculate the change of refractive index, Δn, due to free carriers in various doped silicon is presented. This approach uses a numerical Kramers–Kronig relation to analyze a calculated carrier-related absorption spectrum below or near the energy-band gap. The absorption spectrum is obtained by considering the optical transitions between energy bands and impurity bands, and the free-carrier absorption due to acoustic phonons, optical phonons, and ionized impurities in a spherical nonparabolic band model. Values of Δn at wavelength λ=1.3 and 1.6 μm for different doping levels are obtained. The results are applicable to both the integrated-optics applications and optical-probing applications in silicon.
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