CRITICAL CURRENT DENSITIES IN SUPERCONDUCTING NIOBIUM FILMS SPUTTERED REACTIVELY IN THE PRESENCE OF NITROGEN GAS

Y. Muto, N. Koto, Tadao Fukuroi, Youhei Saito, Takeshi Anayama, Takeshi Mitsuoka, Y. Onodera

Applied Physics Letters · 1968 · 10 citations · 3 references

Concepts

Abstract

A critical current density of about 2 × 105 A/cm2 in a transverse external field of 73 kOe, parallel to the film plane, was obtained at liquid-helium temperature for niobium films deposited on glass substrates by sputtering technique in an argon atmosphere with a dilute addition of nitrogen. This critical current density is larger than any other reported values for refractory metal carbides and nitrides with the NaCl structure.

References

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