Publication | Closed Access
Surface OH groups governing surface chemical properties of SiO2 thin films deposited by RF magnetron sputtering
36
Citations
15
References
2003
Year
Materials ScienceSurface CharacterizationEngineeringNanoelectronicsSurface ScienceApplied PhysicsSurface Oh GroupsSurface Chemical PropertiesThin FilmsSilicon On InsulatorMicroelectronicsThin Film ProcessingSio2 Thin Films
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