The effect of sputter etching on the surface characteristics of dyed aramid fabrics

Abstract

Three kinds of aramid fabrics, Technora (modified p ‐aramid), Conex ( m ‐aramid) and Kevlar ( p ‐aramid), were subjected to sputter etching and argon low‐temperature plasma treatments after dyeing in black with disperse dyes. The depth of shade increased considerably on Technora and Kevlar with the sputter etching treatment, but not on Conex fabrics. Argon low‐temperature plasma treatment had virtually no effect on the depth of shade on the aramid fabrics.