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High‐rate magnetron sputtering of high <i>T</i><sub><i>c</i></sub> Nb<sub>3</sub>Sn films
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1977
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EngineeringThin Film Process TechnologyVacuum DeviceMagnetismHigh‐rate Magnetron SputteringSuperconductivityJ. W. HafstromMagnetic Thin FilmsThin Film ProcessingMaterials SciencePhysicsMaterial PropertyMaterials InterfacesMaterial AnalysisMaterials CharacterizationApplied PhysicsCondensed Matter PhysicsVacuum ScienceThin FilmsTechnology
Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation C. T. Wu, R. T. Kampwirth, J. W. Hafstrom; High‐rate magnetron sputtering of high Tc Nb3Sn films. J. Vac. Sci. Technol. 1 January 1977; 14 (1): 134–137. https://doi.org/10.1116/1.569104 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science and Technology Search Advanced Search |Citation Search