Effect of Si in reactively sputtered Ti-Si-N films on structure and diffusion barrier performance - Concepedia

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Effect of Si in reactively sputtered Ti-Si-N films on structure and diffusion barrier performance

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1997

Year

Xin Sun, E. Kolawa, Seongil Im, C. M. Garland, M.‐A. Nicolet

Applied Physics A

Materials ScienceMaterials EngineeringDiffusion Barrier PerformanceEngineeringNanoelectronicsSurface ScienceApplied PhysicsSemiconductor MaterialSemiconductor Device FabricationThin FilmsSilicon On InsulatorMicroelectronicsThin Film ProcessingTi-si-n Films

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