Resonant tunneling through a Si/Ge<i>x</i>Si1−<i>x</i>/Si heterostructure on a GeSi buffer layer

Abstract

Resonant tunneling of holes through an unstrained GeSi well between two strained Si barriers on a relaxed GeSi buffer layer has been observed for the first time. The peak-to-valley ratios of 2.1/1 at 4.2 K and 1.6/1 at 77 K in current-voltage characteristics were attained for light holes. Resonant tunneling from heavy-hole states was also observed at room temperature, as well as 77 and 4.2 K by conductance measurement. The positions of the resonance peaks are in good agreement with the light- and heavy-hole bound states in the quantum well.