Publication | Open Access
Effects of the narrow band gap on the properties of InN
410
Citations
18
References
2002
Year
SemiconductorsIi-vi SemiconductorElectrical EngineeringWide-bandgap SemiconductorEngineeringNarrow Band GapPhysicsApplied PhysicsCondensed Matter PhysicsQuantum MaterialsReflection ExperimentsSemiconductor MaterialThin FilmsFundamental Band GapOptoelectronicsCompound SemiconductorNarrow-gap Semiconductors
Infrared reflection experiments were performed on wurtzite InN films with a range of free-electron concentrations grown by molecular-beam epitaxy. Measurements of the plasma edge frequencies were used to determine electron effective masses. The results show a pronounced increase in the electron effective mass with increasing electron concentration, indicating a nonparabolic conduction band in InN. We have also found a large Burstein-Moss shift of the fundamental band gap. The observed effects are quantitatively described by the $\mathbf{k}\ensuremath{\cdot}\mathbf{p}$ interaction within the two-band Kane model of narrow-gap semiconductors.
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