<title>Picosecond excimer laser-plasma x-ray source for microscopy, biochemistry, and lithography</title> - Concepedia

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<title>Picosecond excimer laser-plasma x-ray source for microscopy, biochemistry, and lithography</title>

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1994

Year

I. C. E. Turcu, I. N. Ross, P. Trenda, Christopher W. Wharton, Rosalind A. Meldrum, Hiroyuki Daido, Markus Schulz, P. Fluck, A. G. Michette, A. P. Juna,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

X-ray SpectroscopyEngineeringMicroscopyLaser ApplicationsLaser PhysicsBiomedical EngineeringHigh-power LasersSynchrotron Radiation SourceX-ray FluorescenceX-ray ImagingMicroscopy MethodLaser Plasma PhysicsX-ray TechnologyLight MicroscopyRutherford Appleton LaboratoryBiophysicsFree Electron LaserWater WindowPhysicsLaser MicroscopyBiophotonicsSynchrotron RadiationX-ray Free-electron LaserExcimer LasersSpectroscopyApplied PhysicsLaser-plasma X-ray SourceMedicineHigh Temperature

Abstract

At Rutherford Appleton Laboratory we developed a high repetition rate, picosecond, excimer laser system which generates a high temperature and density plasma source emitting approximately 200 mW (78 mW/sr) x ray average power at h(nu) approximately 1.2 KeV or 0.28 KeV < h(nu) < 0.53 KeV (the `water window'). At 3.37 nm wavelength the spectral brightness of the source is approximately 9 X 10<SUP>11</SUP> photons/s/mm<SUP>2</SUP>/mrad<SUP>2</SUP>/0.1% bandwidth. The x-ray source serves a large user community for applications such as: scanning and holographic microscopy, the study of the biochemistry of DNA damage and repair, microlithography and spectroscopy.