Publication | Closed Access
Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiA1N films
54
Citations
33
References
1997
Year
Materials EngineeringMaterials ScienceNitrogen Flow RatesEngineeringNanoelectronicsSurface ScienceApplied PhysicsReactive SputteringThin FilmsChemical Vapor DepositionThin Film ProcessingTia1n Films
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