Publication | Open Access
Optical investigations on isovalent δ layers in III-V semiconductor compounds
27
Citations
12
References
1995
Year
Optical MaterialsEngineeringOptoelectronic DevicesSemiconductor NanostructuresSemiconductorsIi-vi SemiconductorElectronic DevicesOptical PropertiesQuantum MaterialsMolecular Beam EpitaxyCompound SemiconductorPhysicsOptoelectronic MaterialsSemiconductor MaterialFundamental Band GapIsovalent δ DopingCategoryiii-v SemiconductorIsovalent LayersApplied PhysicsIsovalent δ LayersOptoelectronics
In contrast to usual quantum wells or barriers having a thickness of some lattice constants, spatially well-separated, electronically uncoupled monolayers of group-III or V elements are considered as isovalent δ doping or δ layers. Similar to the case of randomly distributed nitrogen dopants in GaP bulk material, it is shown that the two-dimensional arrangement of isovalent atoms brings forth a new quality of III-V semiconductor compounds: The optical emission and absorption properties near the fundamental band gap of indirect-gap, and even of direct-gap, host material, where the isovalent layers are incorporated, are drastically improved. Low-temperature luminescence and transmission experiments on metal-organic vapor-phase epitaxially grown InAs δ layers in GaAs, AlAs δ layers in GaAs, and GaAs monolayers in AlAs are dealt with.
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