Epitaxial growth of 20 nm InAs and GaAs quantum dots on GaAs through block copolymer templated SiO2 masks

Abstract

We report on selective area growth of InAs and GaAs quantum dots (QDs) on GaAs through ∼20 nm SiO2 windows prepared by block copolymer lithography. We discuss the mechanisms of growth through these masks, highlighting the variation of the resulting morphology (dot size, spacing, uniformity, and areal density) as a function of growth parameters. We have obtained highly uniform arrays of InAs and GaAs QDs with mean diameters and areal densities of 20.6 nm and 1×1011 cm−2, respectively. We have also investigated the optical characteristics of these QDs as a function of temperature and drawn correlations between the optical response and their crystalline quality.