Photogated transistor of III-nitride nanorods

Abstract

A III-nitride-based photogated transistor using photons to control the channel width of an otherwise gateless field effect transistor (FET) is investigated. This is accomplished by stacking sequential layers of p-GaN/InGaN/n-GaN on a Si substrate in an array of nanorods. The nitride p-i-n diode can be activated by light, whereupon the nanorod device shows phototransistor characteristics in forward bias but behaves like a photoconductor when in reverse bias. An optically pumped FET model, as justified by the low-dimensional nanogeometry, is used in analysis of the device. The resulting photogate efficiency and photocarrier mobilities are estimated to be ∼0.04 V/(W/cm2) and, ∼2000–3000 cm2/V s, respectively.