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Field-assisted photoemission to 2.1 microns from a Ag/<i>p</i>-In0.77Ga0.23As photocathode
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1980
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PhotonicsElectrical EngineeringOptical MaterialsReflection-mode PhotoemissionEngineeringPhotochemistryOptical PropertiesField-assisted PhotoemissionCompound SemiconductorApplied PhysicsPhotoelectric MeasurementOptoelectronic DevicesHydride ProcessOptoelectronicsAg/p-in0.77ga0.23as Cathode
Reflection-mode photoemission to a 2.1-μm threshold has been achieved from an externally biased Ag/p-In0.77Ga0.23As cathode. Quantum yield at 1.9 μm is 2×10−3 electrons per incident photon for 2.4-V bias and a cathode cooled to ∼125 K. The cathode was grown by vapor-phase epitaxy on a compositionally graded InAsP on InP (100) substrate using the hydride process.
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